UV, in combination with ozone, provides a synergistic approach toward the reduction of trace organics and microbial contamination for ultrapure water (UPW). Being well versed in how all components of a pure water system interrelate ensures optimum performance. We understand the challenges faced in the design and construction of a system for microelectronics production and have the expertise to help with how to integrate with existing systems and ensure optimal performance. With over 500 installations in microelectronics fabs globally, Aquafine® Ultraviolet light (UV) systems have a strong global performance record and are trusted by the biggest brands in the industry.
As critical dimensions for integrated circuits continue to decrease and transistor capacities continue to increase, contaminants in the parts per trillion ranges can produce yield-impacting defects. Organics are polar and weakly ionize in ultrapure water. This poses a considerable challenge to ion exchange resins. To prevent TOC leakage from polishing deionizers, silica and/or boron levels are typically monitored to determine when regenerations should be performed.
Our TOC reduction units complement the organic scavenger resins of the polishing loop by oxidizing trace organics into free radicals (R-OH-) and carbon dioxide, which are more readily addressed by ion exchange resins and/or degasifiers. Should continuous ozone be a process requirement, our UV systems can be used to protect both product and costly microelectronic manufacturing equipment by the dissociation of ozone into dissolved oxygen. If dissolved oxygen (DO) is a concern, our engineers can provide assistance for reducing or eliminating DO as well.
The Avant series from Aquafine utilizes less energy and provides full flexibility for skid-mounted designs, with the ability to mount up to eight reactors. Avant’s innovation, and best in-class components reduce the total cost of ownership and drastically simplify operation and maintenance.
